Clean Room Equipments for micro and Nano Patterning

  • Electron beam, Optical and Imprinting litography
  • pattern generator
  • Excimer laser
  • PECVD deposition systems for dielectric and semiconductive materials
  • Ink-jet printer
  • Gravure printer
  • 3DPlotter for the creation of three-dimensional functional structures with an accuracy of 200 mm;
  • Sputtering Systems
  • Reactive Ion Etching
  • Chemical growth apparatus
  • Thermal evaporation apparatus
  • Network Analyzer
  • Maskaligner for optical litography (UV and Deep-UV)
  • Systems for sensor testing both in air and liquid environment
  • Ultrasonic Welding Machine
  • Dicingsaw